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High-precision Mask
Screen
High-precision Mask

Glass photomask (Photomask / Mask), also known as mask or lithography mask, is a core precision tool in the photolithography process, functioning like a "precision negative film".

Technical Parameters: Accuracy ±1–2nm (EUV mask), resolution ≤1nm (EUV mask), pattern line width 0.01–0.1μm, alignment accuracy ±10–20nm, surface roughness Ra ≤0.1nm.

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